Instability of metal barrier with porous methyl silsesquioxane films

Journal of the Electrochemical Society

Volumn 155, Issue 2, 2008, Pages

  Wang, Pei I ^a,c   Juneja, Jasbir S ^a   Ou, Y ^a   Lu, T M ^a,c   Spencer, Greg S ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DEGRADATION; DIFFUSION BARRIERS; ELECTRODES; MIM DEVICES; POLYMERS;

BIAS-TEMPERATURE STRESS; METAL BARRIER; ORGANOSILOXANE POLYMER; POROUS METHYL SILSESQUIOXANE (MSQ);

DIELECTRIC FILMS;

EID: 37549035892     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2806030     Document Type: Article

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