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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 41-44, 2007, Pages

Superior nanocrystalline silicon network at enhanced growth rate

(2) Das, Debajyoti a Bhattacharya, Koyel a

a DEPARTMENT OF MATERIALS SCIENCE (India)

Author keywords

Helium diluted silane plasma; Nanocrystalline silicon; PECVD; Thin film

Indexed keywords

GROWTH RATE; HYDROGEN BONDS; METASTABLE PHASES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

HELIUM DILUTED SILANE PLASMA; NANOCRYSTALLINE SILICON NETWORK; STRUCTURAL TRANSFORMATION; SUPERIOR CRYSTALLINITY;

NANOCRYSTALLINE SILICON;

EID: 37249057010 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.L1006 Document Type: Article

Times cited : (12)

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