Microstructure of thin films prepared by plasma-enhanced chemical vapour deposition of helium-diluted silane

Applied Surface Science

Volumn 143, Issue 1, 1999, Pages 11-15

  Carabe J ^a   Gandia J J ^a   Gonzalez N ^a   Rodriguez A ^a   Gutierrez M T ^a  

^a CIEMAT   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BORON COMPOUNDS; DENSITY (SPECIFIC GRAVITY); ETCHING; FILM GROWTH; HELIUM; HYDROGEN; ION BOMBARDMENT; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; SILICON;

DIBORANE; HELIUM DILUTION; HIGH RADIO FREQUENCY POWER DENSITIES; HYDROGENATED AMORPHOUS SILICON; MICROCRYSTALLINE SILICON; QUASI EQUILIBRIUM;

THIN FILMS;

EID: 0242406381     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00086-0     Document Type: Article

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