Temperature stability of ZnO:Al film properties for poly-Si thin-film devices

Applied Physics Letters

Volumn 91, Issue 24, 2007, Pages

  Lee, K Y ^a   Becker, C ^a   Muske, M ^a   Ruske, F ^a   Gall, S ^a   Rech, B ^a   Berginski, M ^b   Hupkes J ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; DETERIORATION; SOLAR CELLS; THERMODYNAMIC STABILITY; THIN FILM DEVICES;

SOLID PHASE CRYSTALLIZATION; TEMPERATURE-STABLE CONDUCTIVITY; THIN SILICON FILMS; TRANSPARENT FRONT CONTACTS;

POLYSILICON;

EID: 37149039796     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2824456     Document Type: Article

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