Effects of oxygen flow rate on microstructure and properties of indium molybdenum oxide films by ion beam-assisted deposition

Vacuum

Volumn 82, Issue 5, 2008, Pages 441-447

  Kuo, C C ^a   Liu, C C ^a   Lin, C C ^b   Liou, Y Y ^a   Lan, Y F ^c   He, J L ^c  

^a CHIENKUO TECHNOLOGY UNIVERSITY   (Taiwan)

^b Plastics Industry Development Center Taichung   (Taiwan)

^c FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

Carrier concentration; Indium molybdenum oxide; Ion beam assisted deposition; Mobility; Polyethersulfone substrate

Indexed keywords

CARRIER MOBILITY; CRYSTALLINE MATERIALS; INDIUM COMPOUNDS; MOLYBDENUM COMPOUNDS; OPTOELECTRONIC DEVICES; OXIDE FILMS;

INDIUM MOLYBDENUM OXIDE (IMO) FILMS; ION BEAM-ASSISTED DEPOSITION; MOLYBDENUM OXIDE FILMS; OXYGEN FLOW RATE;

MICROSTRUCTURE;

EID: 37049017770     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.07.060     Document Type: Review

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