Properties of ITO films deposited by r.f.-PERTE on unheated polymer substrates - Dependence on oxygen partial pressure

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 215-218

  Nunes de Carvalho, C ^a,b   Lavareda, G ^a,b   Fortunato, E ^a   Amaral, A ^b  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^b INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

Indium tin oxide; Oxygen partial pressure; Polymer substrates; R.f. Plasma enhanced reactive thermal evaporation; Room temperature

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY; EVAPORATION; OXYGEN; PARTIAL PRESSURE; POLYETHYLENES; THIN FILMS;

FILM DEPOSITION;

INDIUM COMPOUNDS;

EID: 0037416718     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01213-0     Document Type: Conference Paper

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