Removal of SU-8 photoresist using buckling-driven delamination assisted with a carbon dioxide snow jet for microfluidics fabrication

Journal of Micromechanics and Microengineering

Volumn 17, Issue 12, 2007, Pages 2447-2453

  Yang, Sheng Chung ^a,b   Lin, Yu Cheng ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; DELAMINATION; MICROFLUIDICS; PHOTORESISTORS;

MICROFLUIDIC FABRICATION; NON-DESTRUCTIVE METHOD; SNOW JET;

BUCKLING;

EID: 36949015797     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/12/009     Document Type: Article

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