Optimization of a pulsed carbon dioxide snow jet for cleaning CMOS image sensors by using the Taguchi method

Sensors and Actuators, A: Physical

Volumn 139, Issue 1-2 SPEC. ISS., 2007, Pages 265-271

  Yang, Sheng Chung ^a,b   Huang, Keng Shiang ^a   Lin, Yu Cheng ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE   (Taiwan)

Author keywords

Carbon dioxide snow; Cleaning; CMOS image sensor; Taguchi method

Indexed keywords

CARBON DIOXIDE; CMOS INTEGRATED CIRCUITS; IMAGE SENSORS; JETS; OPTIMIZATION; TAGUCHI METHODS;

CARBON DIOXIDE SNOW; CLEANING DISTANCE; INCIDENT ANGLE; PULSING SIGNALS;

SNOW;

EID: 34548170323     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.10.027     Document Type: Article

References (16)

1. Osborn C. Precision cleaning is a quality concern. Manuf. Eng. ED-131 (2003) 112
2. SEMATECH. International Technology Roadmap for Semiconductors (2005)
3. Shishkin D.V., Geskin E.S., and Goldenberg B. Application of ice particles for precision cleaning of sensitive surface. J. Electron. Packaging ED-124 (2002) 355-361
4. 2 applications in microelectronics processing. Microelectron. Eng. ED-65 (2003) 145-152
5. Hoenig S.A. Cleaning surface with dry ice. Compressed Air Mag. ED-8 (1986) 22-24
6. Hoenig S.A. Dry ice snow as a cleaning media for hybrids and integrated circuits. Hybrids Circuit Technol. ED-7 (1990) 34-37
7. Sherman R., and Whitlock W. The removal of hydrocarbons and silicone grease stains from silicon wafers. J. Vac. Sci. Technol. B ED-8 (1990) 563-567
8. 2 snow. J. Vac. Sci. Technol. B ED-8 (1991) 1970-1977
9. Hills M.M. Carbon dioxide jet spray cleaning of molecular contaminants. J. Vac. Sci. Technol. A ED-13 (1995) 30-34
10. Soltani M., and Ahmadi G. On particle adhesion and removal mechanisms in turbulent flows. J. Adhes. Sci. Technol. ED-8 (1994) 763-785
11. Toscano C., and Ahmadi G. Particle removal mechanisms in cryogenic surface cleaning. J. Adhes. ED-79 (2003) 175-201
12. 2 cryogenic technique. J. Adhes. Sci. Technol. ED-19 (2005) 739-751
13. P.E. Lewis, G. Ahmadi, A.G. Tannous, K. Makhamreh, K.H. Compton, Apparatus for cleaning surfaces substantially free of contaminants, US Patent No. 6,543,426 (2003).
14. G. Ahmadi, P.E. Lewis, A.G. Tannous, K. Makhamreh, K.H. Compton, Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide, US Patent No. 6,719,613 (2004).
15. Sherman R., and Adams P. Carbon dioxide snow cleaning-the next generation of clean. Precision Cleaning'95 Proceedings. Chicago, IL, USA (May 1995) 271-300
16. 2 Snow. 21st Annual BACUS Symposium on Photomask Technology. Monterey, CA, USA (October 2001) 600-608