Local strain measurements in shallow trench insulator structures using near-ultraviolet Raman spectroscopy: Simulation and experiment

Journal of Applied Physics

Volumn 102, Issue 10, 2007, Pages

  Latu Romain, Eddy ^a,c   Mermoux, Michel ^a   Crisci, Alexandre ^a   Delille, Dominique ^b   Kwakman, Laurens F Tz ^b  

^a LEPMI   (France)

^b NXP SEMICONDUCTORS   (Netherlands)

^c Freescale Semiconducteurs   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; LINEWIDTH; RAMAN SPECTROSCOPY; STRAIN MEASUREMENT; STRESS ANALYSIS;

SHALLOW TRENCH INSULATOR (STI) STRESS; SPATIAL RESOLUTION; UV EXCITATION;

INSULATING MATERIALS;

EID: 36649024380     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2811947     Document Type: Article

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