Investigation of local stress fields: Finite element modelling and High Resolution X-Ray Diffraction

Materials Research Society Symposium Proceedings

Volumn 875, Issue , 2005, Pages 229-234

  Loubens, A ^a,b   Rivero, C ^a,c   Boivin, Ph ^c   Charlet, B ^d   Fortunier, R ^b   Thomas, O ^a  

^a CNRS   (France)

^b ECOLE DES MINES DE SAINT ETIENNE   (France)

^c STMICROELECTRONICS   (France)

^d CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; NANOSTRUCTURED MATERIALS; SILICON; SINGLE CRYSTALS; X RAY DIFFRACTION ANALYSIS;

IN-PLANE PERIODICITY; LATTICE NODES;

STRESS ANALYSIS;

EID: 30644463636     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-875-o8.3     Document Type: Conference Paper

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