Metalorganic chemical vapor deposition of InGaN layers on ZnO substrates

Journal of Applied Physics

Volumn 102, Issue 10, 2007, Pages

  Wang, Shen Jie ^a   Li, Nola ^a   Park, Eun Hyun ^a   Lien, Siou Cheng ^b   Feng, Zhe Chuan ^a,b   Valencia, Adriana ^c   Nause, Jeff ^c   Ferguson, Ian ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c Cermet Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-RESOLUTION X-RAY DIFFRACTION; INGAN FILMS; ZNO SUBSTRATES;

INDIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHASE SEPARATION; PHOTOLUMINESCENCE; THIN FILMS; X RAY DIFFRACTION;

GALLIUM NITRIDE;

EID: 36649012416     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2817482     Document Type: Article

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