3D Etching profile evolution simulations: Time dependence analysis of the profile charging during SiO2 etching in plasma

Journal of Physics: Conference Series

Volumn 86, Issue 1, 2007, Pages

  Radjenović, Branislav ^a   Radmilović Radjenović, Marija ^b  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36349033424     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/86/1/012017     Document Type: Article

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