Progress on EUV mask fabrication for 32 nm technology node and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 1, 2007, Pages

  Zhang, Guojing ^a   Yan, Pei G ^a   Liang, Ted ^a   Park, Seh Jin ^a   Sanchez, Peter ^a   Shu, Emily Y ^a   Ultanir, Erdem A ^a   Henrichs, Sven ^a   Stivers, Alan ^a   Vandentop, Gilroy ^a   Lieberman, Barry ^a   Qu, Ping ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUV lithography; EUVL mask

Indexed keywords

EUV MASK FABRICATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; MULTILAYERS; NANOTECHNOLOGY;

MASKS;

EID: 36249003764     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728941     Document Type: Conference Paper

References (22)

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21. In preparation for 2007 EUVL symposium
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