A spectroscopic study distinguishing between chemical phase separation with different degrees of crystallinity in Hf(Zr) silicate alloys

Applied Surface Science

Volumn 234, Issue 1-4, 2004, Pages 429-433

  Lucovsky, G ^a   Rayner, G B ^a   Kang, D ^a   Hinkle, C L ^a   Hong, J G ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

Chemical phase separation; High k dielectrics; Nano crystalline phases

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTALLINE MATERIALS; CRYSTALLIZATION; DIELECTRIC MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PHASE SEPARATION; SEPARATION; SILICA; SILICON ALLOYS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

CHEMICAL PHASE SEPERATIONS; HIGH-K DIELECTRICS; NANO-CRYSTALLINE PHASES; SILICATE ALLOYS;

SILICATES;

EID: 3342955623     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.075     Document Type: Conference Paper

References (7)

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3. Maria J.P., Wicaksana D., Kingon A.I., Busch B., Schulte H., Garfunkel E., Gustafsson T. J. Appl. Phys. 90:2001;3476.
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