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Volumn 202, Issue 4-7, 2007, Pages 755-761

Effect of substrate orientation on film properties using AC reactive magnetron sputtering

Author keywords

Chromium nitride; Microstructure; PVD; Substrate orientation; Surface roughness; XPS

Indexed keywords

CHROMIUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; MORPHOLOGY; REACTIVE SPUTTERING; SUBSTRATES; SURFACE ROUGHNESS;

EID: 36048980612     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.05.071     Document Type: Article
Times cited : (7)

References (22)
  • 12
    • 36049032296 scopus 로고    scopus 로고
    • www.webelements.com/webelements/compounds
  • 17
    • 36048959740 scopus 로고    scopus 로고
    • D. Tonini, C. Greggio, G. Keppel, F. Laviano, M. Musiani, G. Torzo, V. Palmieri, Università degli Studi di Padova; INFN-LNL (Legnaro, PD); INFM Padua; Turin, Polytechnic; CNR-IENI, Padua. ITALY. (http://srf.desy.de/fap/paper/ThP11.pdf).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.