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Volumn 202, Issue 4-7, 2007, Pages 755-761
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Effect of substrate orientation on film properties using AC reactive magnetron sputtering
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Author keywords
Chromium nitride; Microstructure; PVD; Substrate orientation; Surface roughness; XPS
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Indexed keywords
CHROMIUM COMPOUNDS;
CRYSTAL MICROSTRUCTURE;
CRYSTAL ORIENTATION;
MAGNETRON SPUTTERING;
MORPHOLOGY;
REACTIVE SPUTTERING;
SUBSTRATES;
SURFACE ROUGHNESS;
CHROMIUM NITRIDE;
COLUMNAR GROWTH;
SUBSTRATE ORIENTATION;
INORGANIC COATINGS;
CHROMIUM COMPOUNDS;
CRYSTAL MICROSTRUCTURE;
CRYSTAL ORIENTATION;
INORGANIC COATINGS;
MAGNETRON SPUTTERING;
MORPHOLOGY;
REACTIVE SPUTTERING;
SUBSTRATES;
SURFACE ROUGHNESS;
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EID: 36048980612
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2007.05.071 Document Type: Article |
Times cited : (7)
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References (22)
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