SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 241-244

Growth mechanism for chromium nitride films deposited by magnetron and triode sputtering methods

(6) Chekour, L a Nouveau, C b,e Chala, A c Labidi, C b Rouag, N a Djouadi, M A d

a Universite Mentouri Constantine (Algeria)

b ENSAM (France)

c UNIVERSITY OF BISKRA (Algeria)

d INSTITUT DES MATÉRIAUX JEAN ROUXEL (France)

e ARTS ET MÉTIERS PARISTECH (France)

Author keywords

Chromium nitride; PVD coatings; Stress; X ray diffraction

Indexed keywords

FILM GROWTH; INORGANIC COATINGS; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SPUTTER DEPOSITION; STRESS ANALYSIS; STRUCTURE (COMPOSITION); X RAY DIFFRACTION ANALYSIS;

CHROMIUM NITRIDE; GROWTH MECHANISM; INTRINSIC STRESS; PHYSICAL VAPOR DEPOSITION COATINGS; STRESS MEASUREMENTS; TRIODE SPUTTERING;

CHROMIUM COMPOUNDS;

COATING;

EID: 24644443777 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.062 Document Type: Article

Times cited : (26)

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