Challenges of residual layer minimisation in thermal nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Bogdanski, Nicolas ^a   Wissen, Matthias ^a   Möllenbeck, Saskia ^a   Scheer, Hella Christin ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Nanoimprint lithography; Polystyrene; Residual layer; Thermal imprint

Indexed keywords

POLYSTYRENES; SELF ASSEMBLY; THICKNESS MEASUREMENT;

RESIDUAL LAYERS; THERMAL IMPRINTS;

NANOIMPRINT LITHOGRAPHY;

LITHOGRAPHY; POLYSTYRENE;

EID: 35648952124     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.736926     Document Type: Conference Paper

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