Dynamic mask defects in hot embossing lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5504, Issue , 2004, Pages 197-203

  Bogdanski, N ^a   Schulz, H ^a   Wissen, M ^a   Scheer, H C ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Hot embossing; Mask defects; Nanoimprint

Indexed keywords

DRY ETCHING; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; POLYSTYRENES; SPIN COATING; TOLUENE; VISCOSITY;

HEAT CONDUCTIVE FOIL; HOT EMBOSSING; MASK DEFECTS; NANOIMPRINT; PATTERN TRANSFER;

MASKS;

EID: 3843137190     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.568034     Document Type: Conference Paper

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