CD-AFM vs CD-SEM for resist LER and LWR measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 I, Issue , 2006, Pages

  Foucher, J ^a   Fabre, A L ^a   Gautier, P ^a  

^a CEA GRENOBLE   (France)

Author keywords

Accuracy; AFM; CD; LER; LWR; Roughness; SEM

Indexed keywords

ALGORITHMS; ATOMIC FORCE MICROSCOPY; COMPOSITION; IMAGE ANALYSIS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TRANSISTORS;

ACCURACY; CRITICAL DIMENSION (CD); LER; LWR;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 33745603171     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659008     Document Type: Conference Paper

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