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Volumn 151, Issue 12, 2004, Pages

Effects of CMP process conditions on defect generation in low-k materials an atomic force microscopy study

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; DELAMINATION; DIELECTRIC MATERIALS; ELASTIC MODULI; PERMITTIVITY;

EID: 10844280828     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1810392     Document Type: Article
Times cited : (44)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.