Illumination optimization with actual information of exposure tool and resist process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Tsujita, Koichiro ^a   Mikami, Koji ^a   Naka, Ryotaro ^a   Baba, Norikazu ^a   Ono, Tomomi ^a   Suzuki, Akiyoshi ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; OPTICAL IMAGE STORAGE; OPTIMIZATION; PATTERN MATCHING; TUNING;

IMAGE LOG SLOPE; OPTICAL IMAGES; PATTERN CURVATURE; TUNING ILLUMINATION;

LIGHTING;

EID: 35148856220     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711048     Document Type: Conference Paper

References (8)

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3. Adam, et al., Polarization Effects in Immersion Lithography, in Proc. SPIE Vol.5377, 2004
4. Huggins, et al., Effect of laser bandwidth on OPE in a modern lithography tool, Proc. SPIE Vol.6154, 2006
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7. Setta, et al., Optimization of Contact Hole Lithography for 65nm node Logic LSI, in Proc. SPIE Vol.6154, 2006
8. Brist, et al., Source polarization and OPC effect on illumination optimization, in Proc. SPIE Vol.5992, 2005