Application of aberration optimization for specific pattern using Nikon's TAP method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Meier, Winfried ^a   Weirauch, Gabriele ^b   Hoepfl, Max ^a   Jahnke, Andreas ^b  

^a Nikon Precision Europe GmbH   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Photolithography CD control; Projection lens; Specific aberration tuning; Wavefront aberration; Zernike Sensitivity

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; LIGHTING; OPTICAL DEVICES; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; SENSITIVITY ANALYSIS; WAVEFRONTS;

PHOTOLITHOGRAPHY CD CONTROL; PROJECTION LENS; SPECIFIC ABERRATION TUNING; WAVEFRONT ABERRATION; ZERNIKE SENSITIVITY;

ABERRATIONS;

EID: 33745795319     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655572     Document Type: Conference Paper

References (5)

1. T.Matsuyama, T.Ishiyama, Y.Ohmura, "Nikon Projection Lens Update", SPIE 5377-65 (2004).
2. N.Irie, M.Hamatani, M.Nei, "Progressive ArF Exposure Tool for the 65nm Node Lithography", SPIE 5754-69 (2005).
3. Y.Shimizu, T.Yamaguchi, K.Suzuki, Y.Shiba, T.Matsuyama, S.Hirukawa, "Aberration Optimization System Using Zernike Sensitivity Method", SPIE 5040-168 (2003).
4. P-PMI is the Phase Measurement Interferometer tool used on Nikon Scanners for wavefront measurement.
5. Litel ISI is a lens aberration measurement tool - Trademark of Litel Instruments