Source polarization and OPC effects on illumination optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Brist, Travis ^a   Bailey, George E ^a   Drozdov, Alexander ^a   Torres, Andres ^a   Estroff, Andrew ^b   Hendrickx, Eric ^b  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b IMEC   (Belgium)

Author keywords

Depth of focus; Illumination optimization; Immersion; OPC; Polarization; Process window

Indexed keywords

LIGHT POLARIZATION; OPTIMIZATION;

ILLUMINATION OPTIMIZATION; IMMERSION; OPC; PROCESS WINDOW;

LIGHTING;

EID: 33644607739     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632371     Document Type: Conference Paper

References (7)

1. C. Hwang, DS Nam, JH Park, SG Woo, HK. Cho, WS Man, "Layer-specific illumination for low k1 periodic and semi-periodic DRAM cell patterns: design procedure and application," Proceedings of SPIE, vol. 5377, pp. 947-952, 2004
2. YS Kang, DS Nam, C. Hwang, SG Woo, HK Cho, WS Han, "Process latitude extension in low k1 DRAM lithography using specific layer oriented illumination design," Proceedings of SPIE, vol. 5040, pp. 1304-1309, 2003
3. Y. Granik, "Illuminator Optimization Methods in Microlithography, " Proceedings of SPIE, vol. 5524, pp. 217-229, 2004
4. J. Word, D. Chou, Y. Gu, J. Sturtevant, "Reduction of Reflective Notching Through Illumination Optimization," Proceedings of SPIE, vol. 4691, pp. 990-998, 2002
5. T. Brist, S. Schulze, "Illumination optimization effects on OPC and MDP," Proceedings of SPIE, vol. 5754, pp. 1179-1189, 2004
6. G. Bailey, K. Adam, T. Brist, O. Toublan, A. Estroff, "Reverse engineering source polarization error," Proceedings of SPIE, vol. 5992, 2005
7. K. Adam, W. Maurer, "Polarization Effects in Immersion Lithography," Proceedings of SPIE, vol. 5377, pp. 329-343, 2004