Effects of laser bandwidth on OPE in a modern lithography tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Huggins, Kevin ^a   Tsuyoshi, Toki ^b   Ong, Meng ^c   Rafac, Robert ^d   Treadway, Christopher ^a   Choudhary, Devashish ^a   Kudo, Takehito ^b   Hirukawa, Shigeru ^b   Renwick, Stephen P ^c   Farrar, Nigel R ^d  

^a INTEL CORPORATION   (United States)

^b NIKON CORPORATION   (Japan)

^c NIKON PRECISION INC   (United States)

^d CYMER INC   (United States)

Author keywords

Bandwidth; Chromatic aberration; E95; FWHM; Laser; OPC; OPE

Indexed keywords

CHROMATIC ABERRATIONS; E95; FWHM; OPC; OPE;

BANDWIDTH; ELECTRONIC DOCUMENT IDENTIFICATION SYSTEMS; LASER APPLICATIONS; MATHEMATICAL MODELS; OPTICAL SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 33745783315     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656816     Document Type: Conference Paper

References (6)

1. S.P. Renwick, "What makes a coherence curve change?", Optical Microlithography XVIII, B.W. Smith, ed., Proceedings of SPIE 5754, p. 1537-1547, SPIE, Santa Clara, 2005.
2. D. Williamson, Nikon Research Corp. of America, private communication.
3. "Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners," M. Terry, I. Lalovic, G. Wells, and A. Smith, Optical Microlithography XIV, C.J. Progler, ed., Proceedings of SPIE 4346, p. 15-24, SPIE, Santa Clara, 2001
4. R.J.Rafac "Overcoming limitations of etalon spectrometers used for spectral metrology of DUV excimer light sources." Optical Microlithography XVII, B.W. Smith, ed., Proc SPIE 5377 p. 846-858, 2004.
5. S. P. Renwick, "Scanner parameters and OPE variation," presented at FujiFilm INTERFACE conference, San Diego, Sept. 2005; to be published.
6. W. J. Dunstan, R. Jacques, R.J. Rafac, R. Rao, F. Trintchouk, "Active Spectral Control of DUV light sources for OPE minimization", to be published at SPIE Optical Microlithography 2006