Overlay performance on tungsten CMP layers using the ATHENA alignment system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 428-440

  Rivera, Giovanni ^a   Rozzoni, Laura ^a   Castellana, Elisabetta ^a   Miraglia, Guido ^a   Lam, Pui ^a   Plauth, Johannes ^a   Dunbar, Allan ^a   Phillips, Merritt ^a  

^a STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; DEPOSITION; INTEGRATED CIRCUIT LAYOUT; MICROELECTRONICS; SENSITIVITY ANALYSIS; TUNGSTEN;

CHEMICAL MECHANICAL POLISHING (CMP); METAL INTERCONNECT LAYERS;

LITHOGRAPHY;

EID: 0033705455     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)