Zero-space microlenses for CMOS image sensors: Optical modeling and lithographic process development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 953-959

  Baillie, Douglas A ^a   Gendler, Jonathan E ^a  

^a TOWER SEMICONDUCTOR LTD   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CHARGE COUPLED DEVICES; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; COMPUTER SOFTWARE; FINITE DIFFERENCE METHOD; LIGHT PROPAGATION; LITHOGRAPHY; OPTICAL TRANSFER FUNCTION; OPTIMIZATION; PHOTORESISTS; TIME DOMAIN ANALYSIS;

MICROLENS; OPTICAL MODELING; OPTICAL SIMULATION; RAYTRACING;

IMAGE SENSORS;

EID: 3843075150     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533453     Document Type: Conference Paper

References (9)

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2. Zemax EE, Zemax Development Corporation
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6. ì Microlens Design for Compact Lens System.ì Hung-Jen Hsu et al. Smart Sensors, Actuators, and MEMs, Proceedings of SPIE Vol 5116 (2003)
7. ì Simulation of Micro-Optical systems including microlens arrays.î Norbert Lindlein. J. Opt. A: Pure and Appl. Opt. 4 (2002)
8. ì 3-D Optical and Electrical Simulation for CMOS Image Sensors.î Hideki Mutoh. IEEE Transactions on Electron Devices, Vol. 50, No.1, January 2003
9. ì Integrated color pixels in 0.18-μm complementary metal oxide semiconductor technology.î Peter B. Catrysse and Brain A. Wandell, J. Opt. Soc. Am. A, Vol 20, No. 12