Modified polymer architecture for immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Kim, Sang Soo ^a   Kim, Jeong Woo ^a   Lee, Jung Youl ^a   Oh, Seung Keun ^a   Lee, Sang Hyang ^a   Kim, Jung Woo ^a   Lee, Jae Woo ^a   Kim, Deog Bae ^a   Kim, Jaehyun ^a   Ban, Keun Do ^b   Bok, Cheol Kyu ^b   Moon, Seung Chan ^b  

^a Dongjin Semichem Co Ltd   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

CTA; Hydrophilicity; Immersion; LWR; PD; RAFT; Thiocarbonylthio

Indexed keywords

FREE RADICAL POLYMERIZATION; HYDROPHILICITY; LITHOGRAPHY; MOLECULAR WEIGHT DISTRIBUTION; OPTICAL DESIGN; SURFACE ROUGHNESS; WETTING;

DEFECTIVITY; DEVICE DESIGNS; LINE WIDTH ROUGHNESS (LWR); RESIST FILMS;

POLYMER MATRIX;

EID: 35148843816     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711657     Document Type: Conference Paper

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