Optical measurement of depth and duty cycle for binary diffraction gratings with subwavelength features

Applied Optics

Volumn 42, Issue 16, 2003, Pages 3234-3240

  Marciante, John R ^a   Farmiga, Nestor O ^a   Hirsh, Jeffrey I ^a   Evans, Michelle S ^a   Ta, Hieu T ^a  

^a Corning Rochester Photonics Corporation ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT POLARIZATION; LIGHT TRANSMISSION; SCANNING ELECTRON MICROSCOPY;

OPTICAL MEASUREMENTS;

DIFFRACTION GRATINGS;

EID: 0042973929     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.003234     Document Type: Article

References (8)

1. G. H. Spencer and M. V. R. K. Murty, “General raytracing procedure,” J. Opt. Soc. Am. 52, 672-678 (1962).
2. S. D. Bennett, J. T. Lindow, and I. R. Smith, “Integrated circuit metrology with confocal optical microscopy,” Philos. Trans. R. Soc. London Ser. A 320, 307-312 (1986).
3. C. J. Raymond, M. R. Murane, S. S. H. Naqvi, and J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484-1495 (1995).
4. B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, “Ellipsometric scatterometry for the metrology of sub-0.1-rm-linewidth structures,” Appl. Opt. 37, 5112-5115 (1998).
5. E. W. Conrad and D. P. Paul, “Method and apparatus for measuring the profile of small repeating lines,” U.S. Patent 5,963,329 (5 October 1999).
6. M. G. Moharam and T. K. Gaylord, “Diffraction analysis of dielectric surface-relief gratings,” J. Opt. Soc. Am. 72, 1285-1392 (1982).
7. E. M. Drege, J. A. Reed, and D. M. Byrne, “Linearized inversion of scatterometric data to obtain surface profile information,” Opt. Eng. 41, 225-236 (2002).
8. H. P. Kleinknecht and H. Meier, “Linewidth measurement on IC masks and wafers by grating test patterns,” Appl. Opt. 19, 525-533 (1980).