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Proceedings of SPIE - The International Society for Optical Engineering
Volumn 6520, Issue PART 1, 2007, Pages
Distinguishing dose, focus and blur for lithography characterization and control
Author keywords

Blur; Lithography; Process control; Process window metrology
Indexed keywords

FOCUS SENSITIVITY; IMAGE PLANES; LITHOGRAPHIC PROCESS; PHYSICAL MODELS;
EID: 35148831246     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712155     Document Type: Conference Paper
Times cited : (24)
References (12)
  • 1
    • 35148843228 scopus 로고    scopus 로고
    • Advanced Lithography Parameters Extraction by using Scatterometry System
    • W. Zhou, et. al. "Advanced Lithography Parameters Extraction by using Scatterometry System," Proc. SPIE 6518 (2007)
    • (2007) Proc. SPIE , vol.6518
    • Zhou, W.1    et., al.2
  • 2
    • 2942696343 scopus 로고    scopus 로고
    • Modeling for profile-based process-window metrology
    • C.P. Ausschnitt, S.Y. Cheng, "Modeling for profile-based process-window metrology", Proc. SPIE 5378, 38 (2004)
    • (2004) Proc. SPIE , vol.5378 , pp. 38
    • Ausschnitt, C.P.1    Cheng, S.Y.2
  • 3
    • 35148843631 scopus 로고    scopus 로고
    • Method of patterning process metrology based on the intrinsic focus offset
    • US7042551
    • C.P. Ausschnitt, "Method of patterning process metrology based on the intrinsic focus offset" US7042551 (2006).
    • (2006)
    • Ausschnitt, C.P.1
  • 4
    • 33745790897 scopus 로고    scopus 로고
    • Laser bandwidth and other sources of focus blur in lithography
    • T. A. Brunner, et. al., "Laser bandwidth and other sources of focus blur in lithography", Proc. SPIE 6154, (2006).
    • (2006) Proc. SPIE , vol.6154
    • Brunner, T.A.1    et., al.2
  • 5
    • 3843054532 scopus 로고    scopus 로고
    • Impact of resist blur on MEF, OPC and CD control
    • T. A. Brunner, et. al. " Impact of resist blur on MEF, OPC and CD control," Proc. SPIE 5377, 141-149 (2004).
    • (2004) Proc. SPIE , vol.5377 , pp. 141-149
    • Brunner, T.A.1    et., al.2
  • 6
    • 0032662506 scopus 로고    scopus 로고
    • Distinguishing Dose and Defocus for In-Line Lithography Control
    • C. P. Ausschnitt, "Distinguishing Dose and Defocus for In-Line Lithography Control," Proc. SPIE, 3677, 140-147 (1999).
    • (1999) Proc. SPIE , vol.3677 , pp. 140-147
    • Ausschnitt, C.P.1
  • 7
    • 0000760137 scopus 로고
    • Quantitative stepper metrology using the focus monitor test mask
    • T. A. Brunner, et al, "Quantitative stepper metrology using the focus monitor test mask," Proc. SPIE, 2197, 541 (1994).
    • (1994) Proc. SPIE , vol.2197 , pp. 541
    • Brunner, T.A.1
  • 8
    • 0141722343 scopus 로고    scopus 로고
    • Novel in situ focus monitor technology in attenuated PSM
    • K. Izuha, et al, "Novel in situ focus monitor technology in attenuated PSM," Proc. SPIE 5040, 590-595 (2003).
    • (2003) Proc. SPIE , vol.5040 , pp. 590-595
    • Izuha, K.1
  • 9
    • 0141723682 scopus 로고    scopus 로고
    • Run-to-Run CD Error Analysis and Control with Monitoring of Effective Dose and Focus
    • M. Asano, et al, "Run-to-Run CD Error Analysis and Control with Monitoring of Effective Dose and Focus," Proc. SPIE, 5038, 239-246 (2003).
    • (2003) Proc. SPIE , vol.5038 , pp. 239-246
    • Asano, M.1
  • 10
    • 0025657772 scopus 로고
    • Exposure Monitor Structure
    • A. Starikov, "Exposure Monitor Structure," Proc. SPIE 1261, 315-324 (1990).
    • (1990) Proc. SPIE , vol.1261 , pp. 315-324
    • Starikov, A.1
  • 11
    • 0141612002 scopus 로고    scopus 로고
    • Improved Model for Focus-Exposure Data Analysis
    • C.A. Mack, J.D. Byers, "Improved Model for Focus-Exposure Data Analysis," Proc. SPIE 5038 (2003) pp. 396-405.
    • (2003) Proc. SPIE , vol.5038 , pp. 396-405
    • Mack, C.A.1    Byers, J.D.2

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.