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Volumn 6518, Issue PART 2, 2007, Pages

Advanced lithography parameters extraction by using scatterometry system

Author keywords

Advanced process control; Exposure energy; Focus; Lens aberration; Post exposure bake (PEB); Scatterometry

Indexed keywords

ABERRATIONS; LITHOGRAPHY; MATHEMATICAL MODELS; PHOTORESISTS; PROCESS CONTROL;

EID: 35148843228     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.702270     Document Type: Conference Paper
Times cited : (6)

References (12)
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    • Zhou, W.Z.1    Alex See, J.Y.2
  • 2
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    • Determination of DICD Best Focus by Top-down CD-SEM
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  • 3
    • 0032402979 scopus 로고    scopus 로고
    • Seeing the forest for the trees: A new approach to CD control
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    • Ausschnitt, C.P.1
  • 4
    • 0032662506 scopus 로고    scopus 로고
    • Distinguishing dose from defocus for in-line lithography control
    • Christopher P. Ausschnitt "Distinguishing dose from defocus for in-line lithography control" Proc. SPIE, 3667 140-147 (1999);
    • (1999) Proc. SPIE , vol.3667 , pp. 140-147
    • Ausschnitt, C.P.1
  • 6
    • 0000760137 scopus 로고
    • Quantitative stepper metrology using the focus monitor test mask
    • T. A. Brunner, et al, "Quantitative stepper metrology using the focus monitor test mask," Proc. SPIE 2197 p. 541. (1994);
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  • 7
    • 0141723532 scopus 로고    scopus 로고
    • Dose and focus estimation using top-down SEM images
    • Chie Shishido, et al "Dose and focus estimation using top-down SEM images" Proc. SPIE, 5038, 1071-1079 (2003);
    • (2003) Proc. SPIE , vol.5038 , pp. 1071-1079
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  • 8
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    • Modeling for Profile-Based Process-Window Metrology
    • Christopher P Ausschnitt, "Modeling for Profile-Based Process-Window Metrology," Proc. SPIE, 5378, 38-47 (2004);
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    • Ausschnitt, C.P.1
  • 9
    • 24644442210 scopus 로고    scopus 로고
    • Focus & Dose Measurement Method in Volume Production
    • Hideki Ina, Satoru Oishi, Koichi Sentoku, " Focus & Dose Measurement Method in Volume Production" Proc. SPIE 5752, 1371-1382 (2005);
    • (2005) Proc. SPIE , vol.5752 , pp. 1371-1382
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  • 10
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    • In-Line-Focus Monitoring Technique Using Lens Aberration Effect
    • Tomohiko Yamamoto, et al, "In-Line-Focus Monitoring Technique Using Lens Aberration Effect" Proc. SPIE 5752, 1-8 (2005);
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  • 11
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    • Multivariate analysis of a 100nm process measured by inline scatterometry
    • Sébastien Egret, Tetsunari Furusho, Bart Baudemprez, "Multivariate analysis of a 100nm process measured by inline scatterometry" Proc. SPIE 5375, 296-306 (2004);
    • (2004) Proc. SPIE , vol.5375 , pp. 296-306
    • Egret, S.1    Furusho, T.2    Baudemprez, B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.