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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

Optical error sensitivities of immersion lithography

(3) Chen, Zheng G a Lai, Kafai a Racette, Ken a

Author keywords

ACLV; CD through pitch; Field flatness; Focal plane deviation; Focus blur; Image plane deviation; Immersion lithography; Laser bandwidth; Mask flatnes; Mask plane deviation; Reticle shape correction; Site to site variation

Indexed keywords

BANDWIDTH; IMAGE PROCESSING; IMAGING TECHNIQUES; LASERS; MATHEMATICAL MODELS; WAFER BONDING;

IMMERSION LITHOGRAPHY; IMMERSION LITHOGRAPHY SYSTEMS; LASER BANDWIDTHS; SENSITIVITY FACTORS;

LITHOGRAPHY;

EID: 35148813096 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.712333 Document Type: Conference Paper

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.