Topography induced defocus with a scanning exposure system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Liegl, Bernhard R ^a   Felix, Nelson ^b   Brodsky, Colin ^a   Dobuzinsky, David ^a  

^a IBM MICROELECTRONICS   (United States)

^b Cornell University   (United States)

Author keywords

Defocus; Depth of focus; Flatness; Focus; Leveling; Step and scan; Topography

Indexed keywords

DEPTH OF FOCUS; EXAGGERATED PROXIMITY EFFECTS; SCANNING EXPOSURE SYSTEM; STATIC IMAGE PLANE;

GAGES; IMAGING SYSTEMS; PROCESS MONITORING; TOPOGRAPHY;

EXPOSURE CONTROLS;

EID: 35148855077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712420     Document Type: Conference Paper

References (1)

1. Jung-Chan Kim ET AL, 'The improvement of DOF for sub-100nm process by focus scan', Proc. SPIE Vol. 6154 (2006)