First microprocessors with immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 119-128

  Gil, D ^a   Bailey, T ^a   Corliss, D ^a   Brodsky, M J ^a   Lawson, P ^a   Rutten, M ^a   Chen, Z ^a   Lustig, N ^a   Nigussie, T ^a   Petrillo, K ^a   Robinson, C ^a  

^a IBM   (United States)

Author keywords

193nm; BEOL; Exposure systems; Hyper NA; Immersion lithography; Microprocessors; Semiconductor manufacturing

Indexed keywords

193NM; BEOL; EXPOSURE SYSTEMS; HYPER NA; IMMERSION LITHOGRAPHY; SEMICONDUCTOR MANUFACTURING;

FABRICATION; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; SCANNING; SEMICONDUCTOR MATERIALS; SILICON WAFERS;

MICROPROCESSOR CHIPS;

EID: 25144472062     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598855     Document Type: Conference Paper

References (11)

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