Characterization of imaging performance for immersion lithography at NA=0.93

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 I, Issue , 2006, Pages

  Gil, Dario ^a   Tirapu Azpiroz, Jaione ^a   Deschner, Ryan ^a   Brunner, Timothy ^a   Fonseca, Carlos ^a   Fullam, Jennifer ^a   Corliss, Dan ^a   Auschnitt, Kit ^a   Vanoppen, Peter ^b  

^a IBM RESEARCH   (United States)

^b ASML US Inc   (United States)

Author keywords

193nm lithography; ACLV; CDU; Design restrictions; Immersion lithography; OPC; Scatterometry

Indexed keywords

193NM LITHOGRAPHY; ACLV; CDU; DESIGN RESTRICTIONS; IMMERSION LITHOGRAPHY; OPC; SCATTEROMETRY;

FOCUSING; IMAGING SYSTEMS; OPTICAL VARIABLES CONTROL; SCANNING; SEMICONDUCTOR MATERIALS;

PHOTOLITHOGRAPHY;

EID: 33745784818     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656545     Document Type: Conference Paper

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