Data retention characteristics of Bi3.25 La0.75 Ti3 O12 thin films on conductive SrRu O3 electrodes

Applied Physics Letters

Volumn 91, Issue 14, 2007, Pages

  Lee, Jang Sik ^a,b   Kang, B S ^a,c   Jia, Q X ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b Kookmin University   (South Korea)

^c Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE ELECTRODES; DATA RETENTION CHARACTERISTICS; DECAY MODELS; POLARIZATION BACKSWITCHING;

BISMUTH ALLOYS; DECAY (ORGANIC); ELECTROCHEMICAL ELECTRODES; POLARIZATION; PULSED LASER DEPOSITION; VACANCIES;

THIN FILMS;

EID: 34948860728     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2780118     Document Type: Article

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