Electron-beam lithography simulation for the fabrication of EUV masks

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 1148-1151

  Patsis, George P ^a   Tsikrikas, Nikos ^a   Raptis, Ioanis ^a   Glezos, Nikos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Electron beam lithography; EUV mask; Monte Carlo simulation; Resist exposure

Indexed keywords

ELECTRON ENERGY; ELECTRON-BEAM LITHOGRAPHY; EUV MASK; RESIST EXPOSURE;

COMPUTER SIMULATION; ENERGY DISSIPATION; MASKS; MONTE CARLO METHODS; MULTILAYERS; ULTRAVIOLET RADIATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 33646034624     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.01.040     Document Type: Article

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