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Volumn 58, Issue 27-28, 2004, Pages 3630-3633
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Influence of annealing on ZnO films grown by metal-organic chemical vapor deposition
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Author keywords
Atomic force microscopy; Chemical vapor deposition; Heat treatment; Surfaces
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Indexed keywords
ANNEALING;
ATOMIC FORCE MICROSCOPY;
FUSED SILICA;
GRAIN BOUNDARIES;
HEAT TREATMENT;
INTERFACIAL ENERGY;
LIGHT EMITTING DIODES;
MAGNETRON SPUTTERING;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
PYROLYSIS;
SPECTROPHOTOMETERS;
SUBSTRATES;
SURFACE ROUGHNESS;
THIN FILMS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
FULL-WIDTH AT HALF MAXIMUM (FWHM);
GROWTH ORIENTATION;
INTERFERENCE FRINGES;
ION ETCHING;
ZINC OXIDE;
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EID: 4944240258
PISSN: 0167577X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.matlet.2004.07.014 Document Type: Article |
Times cited : (30)
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References (15)
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