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Volumn 58, Issue 27-28, 2004, Pages 3630-3633

Influence of annealing on ZnO films grown by metal-organic chemical vapor deposition

Author keywords

Atomic force microscopy; Chemical vapor deposition; Heat treatment; Surfaces

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; FUSED SILICA; GRAIN BOUNDARIES; HEAT TREATMENT; INTERFACIAL ENERGY; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PYROLYSIS; SPECTROPHOTOMETERS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 4944240258     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.07.014     Document Type: Article
Times cited : (30)

References (15)
  • 15
    • 0037462257 scopus 로고    scopus 로고
    • Guotong Du, Jinzhong Wang, et al., Vacuum 69 (2003) 473.
    • (2003) Vacuum , vol.69 , pp. 473
    • Du, G.1    Wang, J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.