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Volumn , Issue , 2007, Pages 405-409

Moisture related low-k dielectric reliability before and after thermal annealing

Author keywords

Leakage; Low k dielectric reliability; Moisture uptake; Plasma modification; TDDB; TDS; Thermal activation energy; Thermal annealing; TVS

Indexed keywords

ACTIVATION ENERGY; LEAKAGE CURRENTS; MOISTURE DETERMINATION; OPTIMIZATION; PLASMA THEORY; RAPID THERMAL ANNEALING;

EID: 34548743500     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2007.369923     Document Type: Conference Paper
Times cited : (8)

References (10)
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  • 2
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    • Michelon, J.1    Hoofman, R.J.O.M.2
  • 3
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    • Effect of moisture on the time dependent dielectric breakdown (TDDB) behavior in an ultra-low-k (ULK) dielectric
    • J. R. Lloyd, T. M. Shaw and E. G. Liniger, "Effect of moisture on the time dependent dielectric breakdown (TDDB) behavior in an ultra-low-k (ULK) dielectric", in IRW Final Report, 2005, pp. 39-43.
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    • Lloyd, J.R.1    Shaw, T.M.2    Liniger, E.G.3
  • 4
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    • Detection of copper and water in low-k dielectrics by triangular voltage sweep measurements
    • San Francisco, CA
    • I. Ciofi, Zs. To′kei, M. Saglimbeni, M. Van Hove, "Detection of copper and water in low-k dielectrics by triangular voltage sweep measurements", Mater. Res. Soc. 2006 Spring Meeting, San Francisco, CA, 2006
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  • 7
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    • Water and copper contamination in SiOC:H damascene: Novel characterization methodology based on triangular voltage sweep measurements
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  • 8
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  • 10
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.