Suppression of short channel effect in organic thin film transistors

Applied Physics Letters

Volumn 91, Issue 11, 2007, Pages

  Tukagoshi, K ^a   Fujimori, F ^b   Minari, T ^b   Miyadera, T ^b   Hamano, T ^b   Aoyagi, Y ^b  

^a RIKEN   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT RESISTANCE; DOPING (ADDITIVES); ELECTRIC SPACE CHARGE; ELECTRON MOBILITY; ORGANIC COMPOUNDS;

CHANNEL LENGTH; FIELD EFFECT MOBILITY; PENTACENE; SHORT CHANNEL EFFECTS;

THIN FILM TRANSISTORS;

EID: 34548666416     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2785118     Document Type: Article

References (20)

1. L. Torsi, A. Dodabalapur, and H. E. Katz, J. Appl. Phys. 78, 1088 (1995).
2. M. D. Austin and S. Y. Chou, Appl. Phys. Lett. 81, 4431 (2002).
3. J. N. Haddock, X. Zhang, S. Zheng, Q. Zhang, S. R. Marder, and B. Kippelen, Org. Electron. 7, 45 (2006).
4. F. Fujimori, K. Shigeto, T. Hamano, T. Minari, T. Miyadera, K. Tsukagoshi, and Y. Aoyagi, Appl. Phys. Lett. 90, 193507 (2007).
5. L. Wang, D. Fine, T. Jung, D. Basu, H. von Seggern, and A. Dodabalapur, Appl. Phys. Lett. 85, 1772 (2004).
6. M. Leufgen, U. Bass, T. Muck, T. Borzenko, G. Schmidt, J. Geurts, V. Wagner, and L. W. Molenkamp, Synth. Met. 146, 341 (2004).
7. J. Collet, O. Tharaud, A. Chapoton, and D. Vuillaume, Appl. Phys. Lett. 76, 1941 (2000).
8. K. Tsukagoshi, K. Shigeto, I. Yagi, and Y. Aoyagi, Appl. Phys. Lett. 89, 113507 (2006).
9. T. Yasuda, K. Fujita, H. Nakashima, and T. Tsutsui, Jpn. J. Appl. Phys., Part 1 42, 6614 (2003).
10. K. Tsukagoshi, I. Yagi, K. Shigeto, K. Yanagisawa, J. Tanabe, and Y. Aoyagi, Appl. Phys. Lett. 87, 183502 (2005).
11. G. B. Blanchet, C. R. Fincher, M. Lefenfeld, and J. A. Rogers, Appl. Phys. Lett. 84, 296 (2004).
12. H. Klauk, G. Schmid, W. Radlik, W. Weber, L. Zhou, C. D. Sheraw, J. A. Nichols, and T. N. Jackson, Solid-State Electron. 47, 297 (2003).
13. I. Yagi, K. Tsukagoshi, and Y. Aoyagi, Appl. Phys. Lett. 84, 813 (2004).
14. R. Schroeder, L. A. Majewski, and M. Grell, Appl. Phys. Lett. 84, 1004 (2004).
15. W. D. Gill, J. Appl. Phys. 43, 5033 (1972).
16. P. N. Murgatroyd, J. Phys. D 3, 151 (1970).
17. A. N. Aleshin, J. Y. Lee, S. W. Chu, J. S. Kim, and Y. W. Park, Appl. Phys. Lett. 84, 5383 (2004).
18. C. D. Dimitrakopoulos, S. Purushothaman, J. Kymissis, A. Callegari, and J. M. Shaw, Science 283, 822 (1999).
19. A. F. Stassen, R. W. I. de Boer, N. N. Iosad, and A. F. Morpurgo, Appl. Phys. Lett. 85, 3899 (2004).
20. Y. Zhang, J. R. Patta, S. Ambily, Y. Shen, D. C. Ralph, and G. G. Malliaras, Adv. Mater. (Weinheim, Ger.) 15, 1632 (2003).