Epitaxial growth of Er2O3 films on oxidized Si(111) and Si(001) substrates

Thin Solid Films

Volumn 508, Issue 1-2, 2006, Pages 86-89

  Zhu, Y Y ^a   Xu, R ^a   Chen, S ^a   Fang, Z B ^a   Xue, F ^a   Fan, Y L ^a   Yang, X J ^a   Jiang, Z M ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Epitaxial growth; Erbium oxide; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON DIFFRACTION; EPITAXIAL GROWTH; ERBIUM COMPOUNDS; OXIDATION; SILICON COMPOUNDS; SURFACE ROUGHNESS;

CRYSTALLINE STRUCTURES; ER SILICIDE; OXIDIZED SI SUBSTRATES;

THIN FILMS;

EID: 33646099155     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.389     Document Type: Article

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