Heteroepitaxial growth of InP/GaAs(100) by metalorganic chemical vapor deposition

Chinese Optics Letters

Volumn 5, Issue 7, 2007, Pages 422-425

  Xiong, Deping ^a   Ren, Xiaomin ^a   Wang, Qi ^a   Zhou, Jing ^a   Shu, Wei ^a   Lu, Jihe ^a   Cai, Shiwei ^a   Huang, Hui ^a   Huang, Yongqing ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EPITAXIAL GROWTH; FULL WIDTH AT HALF MAXIMUM; HETEROJUNCTIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; SEMICONDUCTING GALLIUM ARSENIDE; SUPERLATTICES; X RAY DIFFRACTION ANALYSIS;

HETEROEPITAXIAL GROWTH; STRAINED LAYER SUPERLATTICE (SLS); THERMAL CYCLE ANNEALING (TCA);

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 34547974898     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. Y. M. Kim, M. Dahlstrom, S. Lee, M. J. W. Rodwell, and A. C. Gossard, Solid-State Electron. 46, 1541 (2002).
2. J. H. Jang, G. Cueva, D. C. Dumka, W. E. Hoke, P. J. Lemonias, and I. Adesida, IEEE Photon. Technol. Lett. 13, 151 (2001).
3. M. K. Lee, D. S. Wuu, and H. H. Tung, J. Appl. Phys. 62, 3209 (1987).
4. T. W. Kim, M. Jung, T. H. Park, J. W. Cho, and H. L. Park, Thin Solid Films 257, 36 (1995).
5. M. B. Derbali, J. Meddeb, H. Maaref, D. Buttard, P. Abraham, and Y. Monteil, J. Non. Cryst. Growth 84, 503 (1998).
6. Z. Zhang, S. Yang, F. Zhang, and D. Li, J. Non-Cryst. Growth 243, 71 (2002).
7. C.-I. Liao, K.-F. Yarn, C.-L. Lin, Y.-L. Lin, and Y.-H. Wang, Jpn. J. Appl. Phys. 42, 4913 (2003).
8. J. P. Hirth and X. X. Feng, J. Appl. Phys. 67, 3343 (1989).
9. Y. Takano, T. Sasaki, Y. Nagaki, K. Kuwahara, S. Fuke, and T. Imai, J. Non-Cryst. Growth 169, 621 (1996).
10. Y. Okuno, T. Kawano, M. Koguchi, and K. Nakamura, J. Non-Cryst. Growth 137, 313 (1994).
11. C. Zheng, L. Wang, W. Fang, Y. Pu, J. Dai, and F. Jiang, Acta Opt. Sin. (in Chinese) 26, 463 (2006).
12. M. Yamaguchi, A. Yamamo, M. Tachikawa, Y. Itoh, and M. Sugo, Appl. Phys. Lett. 53, 2293 (1988).
13. H. Uchida, T. Soga, H. Nishikawa, T. Jimbo, and M. Umeno, J. Non-Cryst. Growth 150, 681 (1995).
14. Z. J. Xu, The Foundation of Surface Science of Latter-Day Semiconductor Material (in Chinese) (Peking University Press, Beijing, 1999) p. 387.
15. A. Ren, X. Ren, Q. Wang, D. Xiong, H. Huang, and Y. Huang, Microelectron. J. 37, 700 (2006).
16. M. A. Hayashi and R. Marcon, Rev. Physicae 1, 21 (2000).
17. K. Radhakrishnan, K. Yuan, and W. Hong, J. Non-Cryst. Growth 261, 16 (2004).