Large polycrystalline silicon grains prepared by excimer laser crystallization of sputtered amorphous silicon film with process temperature at 100 °C

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 3 B, 2007, Pages 1245-1249

  He, Ming ^a   Ishihara, Ryoichi ^a   Neihof, Ellen J J ^a   Van Andel, Yvonne ^a   Schellevis, Hugo ^a   Metselaar, Wim ^a   Beenakker, Kees ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Excimer laser crystallization; Plastic substrate; Polycrystalline silicon (poly Si); Sputtering

Indexed keywords

ABLATION; CRYSTALLIZATION; EXCIMER LASERS; MAGNETRON SPUTTERING; THIN FILMS;

ENERGY DENSITY; NON-STRUCTURED OXIDIZED WAFER; PLASTIC FOIL; SUPER LATERAL GROWTH;

POLYSILICON;

EID: 34547867454     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1245     Document Type: Article

References (17)

1. P. M. Smith, P. G. Carey, and T. W. Sigmon: Appl. Phys. Lett. 70 (1997) 342.
2. S. Wagner, H. Gleskova, I.-C. Cheng, and M. Wu: Thin Solid Films 430 (2003) 15.
3. A. Imparato, C. Minarini, A. Rubino, P. Tassini, F. Villani, D. D. Sala, E. Amendola, M. Kunst, H.-C. Neitzert, and S. Bellone: Thin Solid Films 487 (2005) 58.
4. D. P. Gosain, T. Noguchi, and S. Usui: Jpn. J. Appl. Phys. 39 (2000) L179.
5. D. P. Gosain, A. Machida, S. Usui, and M. Arai: Solid State Phenom. 80-81 (2001) 169.
6. A. Burtsev, M. Apel, R. Ishihara, and C. I. M. Beenakker: Thin Solid Films 427 (2003) 309.
7. D. P. Gosain, J. Westwater, and S. Usui: Dig. Tech. Pap. 1997 Int. Worshop Active Matrix Liquid-Crystal Displays, 1997, p. 51.
8. D. Y. Kim, H. S. Cho, K. B. Park, J. Y. Kwon, and J. S. Jung: J. Korean Phys. Soc. 45 (2004) S8471.
9. A. Wikstrom and P. Gudmundson: Acta Mater. 48 (200) 2429.
10. S. Zhang, D. Sun, Y. Q. Fu, H. J. Du, and Q. Zhang: Diamond Relat. Mater. 13 (2004) 1777.
11. Y. Fu, H. Du, and C. Q. Sun: Thin Solid Films 424 (2003) 107.
12. J. H. Hsieh, C. Li, W. Wu, and R. F. Hochman: Thin Solid Films 424 (2003) 103.
13. P. Reinig, F. Fenske, W. Fuhs, and B. Selle: J. Non-Cryst. Solids 299-302 (2002) 128.
14. J. S. Im and H. J. Kim: Appl. Phys. Lett. 64 (1994) 2303.
15. R. Ishihara and F. C. Voogt: Solid State Phenom. 80-81 (2001) 163.
16. P. C. van der Wilt, B. D. van Dijk, G. J. Bertens, R. Ishiara, and C. I. M. Beenakker: Appl. Phys. Lett. 79 (2001) 1819.
17. M. He, E. J. J. Neihof, Y. Van Andel, H. Schellevis, R. Ishihara, J. W. Metselaar, and C. I. M. Beenakker: Mater. Res. Soc. Symp. Proc. 910 (2006) 0910-A21-12.