Single-oriented growth of (111) Cu film on thin ZrN/Zr bilayered film for ULSI metallization

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 10, 2000, Pages 5987-5991

  Yanagisawa, Hideto ^a   Sasaki, Katsutaka ^a   Miyake, Hidekazu ^a   Abe, Yoshio ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; COPPER; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); THERMODYNAMIC STABILITY; THICKNESS MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIER; ZIRCONIUM NITRIDE;

ZIRCONIUM COMPOUNDS;

EID: 0034291776     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5987     Document Type: Article

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