Development of three-dimensional microstages using inclined deep-reactive ion etching

Journal of Microelectromechanical Systems

Volumn 16, Issue 3, 2007, Pages 613-621

  Ando, Yasuhisa ^a   Ikehara, Tsuyoshi ^a   Matsumoto, Sohei ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; INTERFERENCE SUPPRESSION; REACTIVE ION ETCHING; SCANNING; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

COMB ACTUATOR; DEEP REACTIVE ION ETCHING; SUPPORT SUSPENSION;

ELECTROSTATIC ACTUATORS;

EID: 34547842492     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2006.885848     Document Type: Article

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