Double exchange biased magnetic force microscopy tip and comparison of its imaging performance with commercial tips

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 7 A, 2007, Pages 4403-4407

  Han, Gang ^a   Wu, Yihong ^a   Zheng, Yuankai ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

Author keywords

Exchange bias; Magnetic force microscopy; Magnetic thin film; Micromagnetic modeling; Spatial resolution

Indexed keywords

ANTIFERROMAGNETIC MATERIALS; BIAS VOLTAGE; MAGNETIC FORCE MICROSCOPY; MAGNETIC MOMENTS; MAGNETIC RECORDING; THERMODYNAMIC STABILITY;

EXCHANGE BIAS; MAGNETIC RECORDING MEDIA; MICROMAGNETIC MODELING; SPATIAL RESOLUTION;

MAGNETIC THIN FILMS;

EID: 34547838269     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.4403     Document Type: Article

References (29)

1. Y. Martin and H. K. Wickramasinghe: Appl. Phys. Lett. 50 (1987) 1455.
2. D. Rugar, H. J. Mamin, P. Guethner, S. E. Lambert, J. E. Stern, I. Mcfadyen, and T. Yogi: J. Appl. Phys. 68 (1990) 1169.
3. A. Wadas and P. Grutter: Phys. Rev. B 39 (1989) 12013.
4. T. Shinjo, T. Okuno, R. Hassdorf, K. Shigeto, and T. Ono: Science 289 (2000) 930.
5. L. Gao, L. P. Yue, T. Yokota, R. Skomski, S. H. Liou, H. Takahoshi, H. Saito, and S. Ishio: IEEE Trans. Magn. 40 (2004) 2194.
6. G. N. Phillips, M. Siekman, L. Abelmann, and J. C. Lodder: Appl. Phys. Lett. 81 (2002) 865.
7. D. Litvinov and S. Khizroev: Appl. Phys. Lett. 81 (2002) 1878.
8. L. Folks, M. E. Best, P. M. Rice, B. D. Terris, D. Weller, and J. N. Chapman: Appl. Phys. Lett. 76 (2000) 909.
9. S. Y. Chou, M. S. Wei, and P. B. Fischer: IEEE Trans. Magn. 30 (1994) 4485.
10. P. B. Fischer, M. S. Wei, and S. Y. Chou: J. Vac. Sci. Technol. B 11 (1993) 2570.
11. M. Ruhrig, S. Porthun, and J. C. Lodder: Rev. Sci. Instrum. 65 (1994)
12. G. D. Skidmore and E. D. Dahlberg: Appl. Phys. Lett. 71 (1997) 3293.
13. I. Utke, P. Hoffmann, R. Berger, and L. Scandella: Appl. Phys. Lett. 80 (2002) 4792.
14. M. R. Koblischka and U. Hartmann: Ultramicroscopy 97 (2003) 103.
15. P. Leinenbach, U. Memmert, J. Schelten, and U. Hartmann: Appl. Surf. Sci. 144-145 (1999) 492.
16. R. Jumpertz, P. Leinenbach, A. W. A. van der Hart, and J. Schelten: Microelectron. Eng. 35 (1997) 325.
17. T. Arie, H. Nishijima, S. Akita, and Y. Nakayama: J. Vac. Sci. Technol. B 18 (2000) 104.
18. Z. Deng, E. Yenilmez, J. Leu, J. E. Hoffman, E. W. J. Straver, H. J. Dai, and K. A. Moller: Appl. Phys. Lett. 85 (2004) 6263.
19. H. Kuramochi, T. Uzumaki, M. Yasutake, A. Tanaka, H. Akinaga, and H. Yokoyama: Nanotechnology 16 (2005) 24.
20. C. H. Oon, J. T. L. Thong, Y. Lei, and W. K. Chim: Appl. Phys. Lett. 81 (2002) 3037.
21. J. O. Oti, P. Rice, and S. E. Russek: J. Appl. Phys. 75 (1994) 6881.
22. Z. Y. Liu, D. You, J. J. Qiu, and Y. H. Wu: J. Appl. Phys. 91 (2002) 8843.
23. Y. H. Wu, Y. T. Shen, Z. Y. Liu, K. B. Li, and J. J. Qiu: Appl. Phys. Lett. 82 (2003) 1748.
24. U. Hartmann: J. Appl. Phys. 64 (1988) 1561.
25. G. Han, Y. H. Wu, Y. K. Zheng, J. J. Qiu, and K. B. Li: J. Magn. Magn. Mater. 303 (2006) e226.
26. T. Goddenhenrich, H. Lemke, M. Muck, U. Harmann, and C. Heiden: Appl. Phys. Lett. 57 (1990) 2612.
27. C. D. Wright and E. W. Hill: Appl. Phys. Lett. 67 (1995) 433.
28. Y. K. Zheng, Y. H. Wu, and T. C. Chong: IEEE Trans. Magn. 36 (2000) 3158.
29. K. B. Li, Y. H. Wu, G. C. Han, P. Luo, L. H. An, J. J. Qiu, Z. B. Guo, and Y. K. Zheng: J. Appl. Phys. 94 (2003) 5905.