Magnetically refined tips for scanning force microscopy

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 325-328

  Jumpertz, R ^a   Leinenbach, P ^a   Van Der Hart, A W A ^a   Schelten, J ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM COMPOUNDS; EVAPORATION; ION BEAMS; MAGNETIC FILMS; NICKEL; PLASMAS; PROBES; SILICON; SPUTTER DEPOSITION; SPUTTERING; THIN FILMS;

BROAD AREA ION BEAM SPUTTER ETCHING; ION BEAM SPUTTERING; MAGNETIC FORCE MICROSCOPY; PLASMA ION SPUTTERING; SCANNING FORCE MICROSCOPY;

FERROMAGNETIC MATERIALS;

EID: 0031073543     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00133-5     Document Type: Article

References (5)

1. Broers A N, Molzen W, Cuomo J J, Wittels N A : Electron-beam fabrication of 80 metal structures. Appl. Physics Letters 29 , 596 - 598 (1976)
2. Chou S Y, Wie M S, Fischer P B : An ultrahigh resolution single-domain magnetic force microscope tip fabricated using ion lithography. IEEE Transactions on Magnetics 30 , 4485 -4488 (1994)
3. Grütter P, Mamin H J, Rugar D : Magnetic force microscopy (MFM). Springer Tracts in Surface Sciences 28, 151-207 (1992)
4. Hübner B, Koops H W P, Pagnia H, Urban H, Weber M : Tips for scanning tunneling microscopy produced by electron-beam induced deposition.Ultramicroscopy 42-44 , 1519 - 1525 (1992)
5. Ohlsson O : Private communications Nanosensors GmbH, Wacholderweg 8, 71134 Aidlingen Germany (1995)