Lifetime measurements on collector optics from Xe and Sn extreme ultraviolet sources

Journal of Applied Physics

Volumn 102, Issue 2, 2007, Pages

  Srivastava, S N ^a   Thompson, K C ^a   Antonsen, E L ^a   Qiu, H ^a   Spencer, J B ^a   Papke, D ^a   Ruzic, D N ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUXES; LIGHT SOURCES; LITHOGRAPHY; REFLECTION; TIN; XENON;

COLLECTOR OPTICS; DEBRIS MITIGATION; ION ENERGY ANALYZER;

ULTRAVIOLET RADIATION;

EID: 34547605635     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2756525     Document Type: Article

References (24)

1. D. J. Resnick, Proc. SPIE 6, 205 (2002).
2. EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Bellingham, WA, 2005).
3. K. C. Thompson, E. Antonsen, M. R. Hendricks, B. E. Jurczyk, M. Williams, and D. N. Ruzic, Microelectron. Eng. 83, 476 (2005).
4. H. Komori, G. Soumagne, H. Hoshino, T. Abe, T. Suganuma, Y. Imai, A. Endo, and K. Toyoda, Proc. SPIE 5374, 839 (2004).
5. K. Takenoshita, C.-S. Koay, S. Teerawattanasook, and M. Richardson, Proc. SPIE 5374, 954 (2004).
6. D. N. Ruzic, K. C. Thompson, B. E. Jurczyk, E. Antonsen, S. N. Srivastava, and J. B. Spencer, IEEE Trans. Plasma Sci. 35, 606-613 (2007).
7. B. A. M. Hansson, Rev. Sci. Instrum. 75, 2122 (2004).
8. K. Takenoshita, C.-S. Koay, S. George, S. Teerawattansook, M. Richardson, and V. Bakshi, J. Vac. Sci. Technol. B 23, 6 (2005).
9. D. L. Rokusek, J. P. Allain, A. Hassanein, and M. Nieto, U.S. Department of Energy Journal of Undergraduate Research (http://www.scied.science.doe.gov).
10. Martin Nieto, J. Appl. Phys. 100, 053510 (2006).
11. M. Richardson, C.-S. Koay, K. Takenoshita, C. Keyser, and M. Al-Rabban, J. Vac. Sci. Technol. B 22, 2 (2004).
12. H. Komori, J. Vac. Sci. Technol. B 21, 6 (2003).
13. B. A. M. Hansson, Proc. SPIE 4688, 102 (2002).
14. R. J. Anderson, D. A. Buchenauer, L. Klebanoff, O. R. Wood II, and N. V. Edwards, Proc. SPIE 5374, 710 (2004).
15. XTREME Technologies GmbH, Gottingen, Germany (www.xtremetec.de).
16. Osaka Vacuum, Ltd., Naniwa, Osaka, Japan (www.osakavacuum.co.jp).
17. International Radiation Detectors, Inc., Torrance, CA (www.ird-inc.com).
18. S. Bajt, Proc. SPIE 7, 236 (2003).
19. Comstock, Inc., Oak Ridge, TN (www.comstockinc.com).
20. Burle Electro-Optics, Sturbridge, MA (www.burle.com).
21. E. Antonsen, K. C. Thompson, M. R. Hendricks, D. A. Alman, B. E. Jurczyk, and D. N. Ruzic, J. Appl. Phys. 99, 063301 (2006).
22. Ortec, Oak Ridge, TN (www.ortec-online.com).
23. Agilent Technologies, Inc, Palo Alto, CA (www.agilent.com).
24. H. Qiu, K. C. Thompson, S. N. Srivastava, E. L. Antonsen, D. A. Alman, B. E. Jurczyk, and D. N. Ruzic, J. Microlithogr., Microfabr., Microsyst. 5, 033007 (2006).