Ultrahigh-resolution pattern using electron-beam lithography HF wet etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 4, 2007, Pages 1147-1151

  Tiron, R ^a   Mollard, L ^a   Louveau, O ^b   Lajoinie, E ^b  

^a CEA GRENOBLE   (France)

^b ST   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); INTEGRATED CIRCUITS; PH EFFECTS; SILICA; WET ETCHING;

HARD MASK ETCHING; NANOSCALE DEVICES; RESIST STRIPPING; RESIST TRIMMING;

ELECTRON BEAM LITHOGRAPHY;

EID: 34547596251     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2743653     Document Type: Article

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