Low temperature electric transport properties in hydrogenated microcrystalline silicon films

Thin Solid Films

Volumn 515, Issue 19 SPEC. ISS., 2007, Pages 7629-7633

  Ambrosone, G ^a   Coscia, U ^a   Cassinese, A ^a   Barra, M ^a   Restello, S ^b   Rigato, V ^b   Ferrero, S ^c  

^a UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^b LABORATORI NAZIONALI DI LEGNARO   (Italy)

^c POLITECNICO DI TORINO   (Italy)

Author keywords

DC conductivity; Microcrystalline silicon; Variable range hopping

Indexed keywords

ACTIVATION ENERGY; ELECTRIC CONDUCTIVITY; ELECTRIC FIELD EFFECTS; FERMI LEVEL; MICROCRYSTALLINE SILICON; THIN FILMS;

DC CONDUCTIVITY; DIFFUSION MODEL; HOPPING PARAMETERS; VARIABLE RANGE HOPPING;

TRANSPORT PROPERTIES;

EID: 34547575061     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.180     Document Type: Article

References (23)

1. Meier J., Fluckiger R., Keppner H., and Shah A. Appl. Phys. Lett. 65 (1994) 860
2. Mulato M., Chen Y., Wagner S., and Zanatta A.R. J. Non-Cryst. Solids 266-269 (2000) 1260
3. Kondo M., Nasuno Y., Mase H., Wada T., and Matsuda A. J. Non-Cryst. Solids 299-302 (2002) 108
4. Alpium P., Chu V., and Conde J.P. J. Appl. Phys. 86 (1999) 3812
5. Saha S.C., Rath J.K., Kshirsagar S.T., and Ray S. J. Phys. D Appl. Phys. 30 (1997) 2686
6. Hamma S., and Roca I Cabarrocas P. Sol. Energy Mater. Sol. Cells 69 (2001) 217
7. Han D., Wang K., Owens J.M., Gedvilas L., Nelson B., Habuchi H., and Tanaka M. J. Appl. Phys. 93 (2003) 3776
8. Ambrosone G., Coscia U., Lettieri S., Maddalena P., and Minarini C. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 100 (2003) 236
9. Orton J.W., and Powell M.J. Rep. Prog. Phys. 43 (1980) 1263
10. Sharma R.P., Shukla A.K., Kapoor A.K., Srivastava R., and Mathur P.C. J. Appl. Phys. 57 (1985) 2026
11. Mott N.F. Philos. Mag. 19 (1969) 333
12. Dussan A., and Buitrago R.H. J. Appl. Phys. 97 (2005) 043711
13. Concari S.B., and Buitrago R.H. J. Non-Cryst. Solids 338-340 (2004) 331
14. Liu F., Zhu M., Feng Y., Han Y., and Liu J. Thin Solid Films 395 (2001) 97
15. Brenot R., Vanderhaghen R., Drevilon B., Rocai Cabarrocas P., Rogel R., and Mahammed-Brahim T. Thin Solid Films 383 (2001) 53
16. Veprek S., Sarott F.A., and Iqbal Z. Phys. Rev., B 36 (1987) 3344
17. He Y., Yin C., Chen G., Wang L., Liu X., and Hu G.Y. J. Appl. Phys. 75 (1994) 797
18. Houben L., Luysberg M., Hapke P., Carius R., Finger F., and Wagner H. Philos. Mag. A 77 (1998) 1447
19. Droz C., Vallat-Sauvain E., Bailat J., Feitknecht L., Meier J., and Shah A. Sol. Energy Mater. Sol. Cells 81 (2004) 61
20. Vallat-Sauvain E., Kroll U., Meier J., Wyrsch N., and Shah A. J. Non-Cryst. Solids 266-269 (2000) 125
21. Thamilselvan M., Premnazer K., Mangalaraj D., and Narayandass Sa.K. Physica, B 337 (2003) 404
22. Concari S.B., Buitrago R.H., Gutierrez M.T., and Gandia J.J. J. Appl. Phys. 94 (2003) 2417
23. Moustafa S.H., Koos M., and Pocsik I. J. Non Cryst. Sol. 227-230 (1998) 1087