Electrical transport properties of microcrystalline silicon thin films prepared by Cat-CVD

Thin Solid Films

Volumn 395, Issue 1-2, 2001, Pages 97-100

  Liu, F ^a   Zhu, M ^a   Feng, Y ^a   Han, Y ^a   Liu, J ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Catalytic chemical vapor deposition; Electrical transport properties; Microcrystalline silicon

Indexed keywords

ACTIVATION ENERGY; CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; CONTAMINATION; CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY; ELECTRON EMISSION; ELECTRON TRANSPORT PROPERTIES; ENERGY GAP; IONIC CONDUCTION; OXYGEN; SEMICONDUCTING SILICON;

THERMIONIC EMISSIONS;

THIN FILMS;

EID: 0035801051     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01218-4     Document Type: Conference Paper

References (9)